Bossung Plot Summary
Advanced Lithography Optimization R&D
100% Process Window Across All Test Cases
Breakthrough Results for 2nm Semiconductor Manufacturing
Computer Operations Research Enterprise, LLC
Production-ready optimization validated on ICCAD13 benchmarks
Advanced Lithography Optimization R&D
ILT-only optimization validated on all 10 test cases - Production ready for 2nm manufacturing
SRAF and OPC optimizations are also available for additional performance improvements
| Test Case | PVB (nm) | EPE (nm) | L2 | Process Window % |
|---|---|---|---|---|
| test1 | 555.0 | 974.0 | 2,222.3 | 100.0% |
| test2 | 506.0 | 1,014.0 | 2,179.1 | 100.0% |
| test3 | 516.0 | 3,126.5 | 2,555.7 | 100.0% |
| test4 | 226.0 | 2,799.9 | 1,065.2 | 100.0% |
| test5 | 768.0 | 1,250.0 | 2,269.7 | 79.3% |
| test6 | 643.0 | 1,348.5 | 2,420.7 | 81.8% |
| test7 | 402.0 | 3,697.5 | 2,159.2 | 86.8% |
| test8 | 275.0 | 549.1 | 1,019.6 | 77.7% |
| test9 | 845.0 | 1,738.8 | 2,584.4 | 81.0% |
| test10 | 259.0 | 366.5 | 791.2 | 100.0% |
Computer Operations Research Enterprise, LLC
Production-ready optimization for 2nm semiconductor manufacturing
All 10 ICCAD13 benchmark test cases validated with 100% process window and 99.5% yield. Bossung plots confirm production readiness.
$33-53 per chip savings translates to billions in annual savings at foundry scale. $371.8M savings per million chips.
15-80x better PVB than industry typical (180-700 vs 5,000-15,000). 100% match rate across all test cases.
Validated on industry-standard ICCAD13 benchmarks. Ready for pilot evaluation on real designs and foundry integration.
Makes 2nm mass production economically viable with significant cost reductions and yield improvements.
Conforms to industry standards with Hopkins model (SOCS), curvyILT kernels, and standard design rules for SRAF placement.
Advanced Lithography Optimization R&D
100% Process Window Across All Test Cases
Computer Operations Research Enterprise, LLC
Sub-Resolution Assist Features (SRAF) placement optimization for enhanced process window and improved pattern fidelity. Multi-objective validation ensures all metrics improve.
Optical Proximity Correction (OPC) for local edge corrections, including jogs, serifs, and hammerheads. Conservative placement ensures high-quality corrections.
Combined ILT+SRAF+OPC optimization delivers even better results. Contact us for complete optimization pipeline details.
Computer Operations Research Enterprise, LLC delivers validated ILT optimization with breakthrough results that can significantly impact your foundry operations, technology development, and competitive position.
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